Browsing by Author "Hippler, Rainer"

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Citation Count: Hundur, Y., Güvenç, Z.B., Hippler, R. (2008). Dynamical analysis of sputtering at threshold energy range: Modelling of Ar+Ni(100) collision system. Chinese Physics Letters, 25(2), 730-733.
Dynamical analysis of sputtering at threshold energy range: Modelling of Ar+Ni(100) collision system
(IOP Publishing Ltd, 2008) Hundur, Yakup; Güvenç, Büşra; Hippler, Rainer; 29853
The sputtering process of Ar+Ni(100) collision systems is investigated by means of constant energy molecular dynamics simulations. The Ni(100) slab is mimicked by an embedded-atom potential, and the interaction between the projectile and the surface is modelled by using the reparametrized ZBL potential. Ni atom emission from the lattice is analysed over the range of 20-50 eV collision energy. Sputtering yield, angular and energy distributions of the scattered Ar and of the sputtered Ni atoms are calculated, and compared to the available theoretical and experimental data
Citation Count: Hundur, Y., Güvenç, Z.B., Rainer, H. (2010). Molecular dynamics of thermal vibration effects: Ar + Ni(100) collision system. Communications In Nonlinear Science And Numerical Simulation, 15(4), 1103-1110. http://dx.doi.org/10.1016/j.cnsns.2009.05.031
Molecular dynamics of thermal vibration effects: Ar + Ni(100) collision system
(Elsevier Science, 2010) Hundur, Yakup; Güvenç, Büşra; Hippler, Rainer; 29853
In this work constant energy molecular dynamics simulations are achieved for investigating sputtering process of Ar + Ni(1 0 0) collision system. The Ni crystal is imitated by an embedded-atom potential, whereas the interaction between the projectile and the surface is modeled by re-parameterized ZBL potential. Seven hundred eighty-four Ar atoms carrying 20-50 eV are sent towards a Ni(1 0 0) surface at normal incidence. Each projectile meets with different initial coordinates (phase) of the nickel atoms because of thermal vibrations in the slab. Effects of the different initial phases of the surface are compared with the available theoretical and experimental data
Citation Count: Hundur, Y., Hipper, R., Güvenç, Z.B. (2006). Molecular dynamics study of a thermal expansion coefficient: Ti bulk with an elastic minimum image method. Chinese Physics Letters, 23(5), 1068-1071. http://dx.doi.org/10.1088/0256-307X/23/5/002
Molecular dynamics study of a thermal expansion coefficient: Ti bulk with an elastic minimum image method
(IOP Publishing LTD, 2006) Hundur, Yakup; Hippler, Rainer; Güvenç, Ziya B.; 29853
Linear thermal expansion coefficient (TEC) of Ti bulk is investigated by means of molecular dynamics simulation. The elastic minimum image convention of periodic boundary conditions is introduced to allow the bulk to adjust its size according to the new fixed temperature. The TEC and the specific heat of Ti are compared to the available theoretical and experimental data.
Citation Count: Guvenc, ZB; Hundur, Y; Hippler, R, "Sputtering yield and dynamical analysis of Ni(100) surface: A comparison of four different Ar-surface interaction potentials", 18th International Conference on Atomic Collisions in Solids (ICACS-18), Vol. 164, pp. 854-860, (2000).
Sputtering yield and dynamical analysis of Ni(100) surface: A comparison of four different Ar-surface interaction potentials
(2000) Güvenç, Ziya B.; Hundur, Yakup; Hippler, Rainer
The sputtering process of the Ar + Ni(100) collision system is investigated by means of constant energy molecular dynamics simulations. The Ni(100) is mimicked by an embedded-atom potential, and the interaction between the projectile and the surface is modelled by using four different screened Coulomb type potentials. The Ni atom emission from the lattice is analysed over the range of 10-40 eV collision energy. The maximum penetration depths of Ar, probability distributions of kinetic energy of the reflected Ar, and energy of the Ar and sputtered Ni atoms in the same collision events are evaluated as functions of the impact energy and sputtering time. Further, angular distributions of the scattered Ar are obtained. The calculated sputtering yields are compared with the available theoretical and experimental data. (C) 2000 Elsevier Science B.V. All rights reserved.