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Dynamical analysis of sputtering at threshold energy range: Modelling of Ar+Ni(100) collision system

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dc.contributor.authorHundur, Yakup
dc.contributor.authorGüvenç, Büşra
dc.contributor.authorHippler, Rainer
dc.contributor.authorID29853tr_TR
dc.date.accessioned2016-04-27T09:09:40Z
dc.date.available2016-04-27T09:09:40Z
dc.date.issued2008
dc.departmentÇankaya Üniversitesi, Mühendislik Fakültesi, Elektronik ve Haberleşme Mühendisliğien_US
dc.description.abstractThe sputtering process of Ar+Ni(100) collision systems is investigated by means of constant energy molecular dynamics simulations. The Ni(100) slab is mimicked by an embedded-atom potential, and the interaction between the projectile and the surface is modelled by using the reparametrized ZBL potential. Ni atom emission from the lattice is analysed over the range of 20-50 eV collision energy. Sputtering yield, angular and energy distributions of the scattered Ar and of the sputtered Ni atoms are calculated, and compared to the available theoretical and experimental dataen_US
dc.description.publishedMonth2
dc.identifier.citationHundur, Y., Güvenç, Z.B., Hippler, R. (2008). Dynamical analysis of sputtering at threshold energy range: Modelling of Ar+Ni(100) collision system. Chinese Physics Letters, 25(2), 730-733.en_US
dc.identifier.endpage733en_US
dc.identifier.issn0256-307X
dc.identifier.issue2en_US
dc.identifier.startpage730en_US
dc.identifier.urihttp://hdl.handle.net/20.500.12416/917
dc.identifier.volume25en_US
dc.language.isoenen_US
dc.publisherIOP Publishing Ltden_US
dc.relation.ispartofChinese Physics Lettersen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectSurfaceen_US
dc.subjectYielden_US
dc.titleDynamical analysis of sputtering at threshold energy range: Modelling of Ar+Ni(100) collision systemtr_TR
dc.titleDynamical Analysis of Sputtering at Threshold Energy Range: Modelling of Ar+ni(100) Collision Systemen_US
dc.typeArticleen_US
dspace.entity.typePublication

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